Vol.3 , No. 6, Publication Date: Dec. 5, 2017, Page: 94-101
[1] | Alejandro Avila Garcia, Department of Electrical Engineering, Center of Research and Advanced Studies, Mexico City, Mexico. |
[2] | Luis Ortega Reyes, Department of Electrical Engineering, Center of Research and Advanced Studies, Mexico City, Mexico. |
[3] | Gabriel Romero-Paredes, Department of Electrical Engineering, Center of Research and Advanced Studies, Mexico City, Mexico. |
[4] | Yuriy Koudriatsev, Department of Electrical Engineering, Center of Research and Advanced Studies, Mexico City, Mexico. |
Metal-insulator-metal (MIM) structures based on non-homogeneous titanium oxide films obtained by thermal oxidation of titanium metallic films were built. Oxygen and titanium concentrations are variable within the films, but a rutile structure is resembled. Digitized current-voltage measurements at room temperature under sinusoidal voltage showed hysteretic behavior. Although none memristive specific model was fitted to the electric data, the basic expressions established by Prof. Chua for the foreseen memristor yielded a detailed description of charge, magnetic flux and memristance along with their evolution during some of the first measurements. The constitutive Flux-Charge and Memristance State-map relationships of our typical device were also derived. The inverse of the experimental constitutive relationship was fitted to a double sigmoidal function. This dependence allowed describing the behavior of the same structure under different biasing waveforms: square, triangular and sawtooth. The largest memristance span turned out from the square waveform. Exponential time-dependences of the resistance between about 5 and 164 kΩ under ± 2 voltages were determined. The process used, which was based on simple spreadsheet calculations can be applied to any experimental memristive device to observe its basic performance and lead to further analysis in terms of some specific model.
Keywords
Memristive Structure, Thermal Oxidation, Prof. Chua’s Theory
Reference
[01] | S. R. Ovshinsky, Reversible electrical switching phenomena in disordered structures, Phys. Rev. Lett., V. 21, No. 20, Nov. 1968, pp. 1450-1453. |
[02] | I. Balberg, Simple test for double injection initiation of switching, Appl. Phys. Lett., V. 16 No. 12, June 1970, pp. 491-493. |
[03] | W. D. Buckley and S. H. Holmberg, Electrical Characteristics and threshold switching in amorphous semiconductors, Solid-State Electronics, V. 18, 1975, pp. 127-147. |
[04] | H. J. Hovel, Switching and memory in ZnSe-Ge heterojunctions, Appl. Phys. Lett. V. 17, No. 4, August 1970, pp. 141-143. |
[05] | P. G. LeComber, A. E. Owen, W. E. Spear, J. Hajto, and W. K. Choi, Electronic switching in amorphous silicon junction devices, Semiconductors and Semimetals, Vol. 21, Part D, 1984, pp. 275-289. |
[06] | A. Avila G., ac measurements in non-volatile amorphous silicon memories, M.Sc. Thesis, developed at the University of Edinburgh and submitted at the University of Dundee, Scotland, Sept. 1986. |
[07] | D. B. Strukov, G. S. Snider, D. R. Stewart, and R. S. Williams, The missing memristor found, Nature, Vol. 453, pp. 80-83, (2008). |
[08] | L. O. Chua, Memristor – the missing circuit element, IEEE Trans. Circuit Theory, Vol. 18, Issue 5, pp. 507-519, (1971). |
[09] | S. H. Jo, K. H. Kim, W. Lu, High-density crossbar arrays based on a Si memristive system, Nano Lett. 9, 870–874 (2009). |
[10] | Y. Joglekar and S. Wolf, "The elusive memristor: properties of basic electrical circuits," Eur. J. Phy., vol. 30, 2009, pp. 661–675. |
[11] | Milka POTREBIC, Dejan TOSIC, Application of Memristors in Microwave Passive Circuits, RADIOENGINEERING, VOL. 24, NO. 2, JUNE 2015. |
[12] | D. Jeong, H. Schroeder, and R. Waser, \Impedance spectroscopy of TiO2 thin films showing resistive switching," Applied Physics Letters, vol. 89, no. 8, 2006. |
[13] | Reut Wizenberg, Applications of Solid-State Memristors in Tunable Filters, IEEE, 2014. |
[14] | B. J. Choi, D. S. Jeong, S. K. Kim, C. Rohde, S. Choi, J. H. Oh, H. J. Kim, C. S., Hwang, K. Szot, R. Waser, B. Reichenberg, and S. Tiedke, “Resistive switching mechanism of TiO2 thin films grown by atomic-layer deposition," Journal of Applied Physics, vol. 98, no. 3, 2005. |
[15] | Yulia Khrapovitskaya, Natalia Maslova, Ivan Sokolov, Yulia Grishchenko, Dmitry Mamichev, and Maxim Zanaveskin, The titanium oxide memristor contact material’s influence on element’s cyclic stability to degradation, P hys. Status Solidi C 12, No. 1–2, 202–205 (2015) / DOI 10.1002/pssc.201400109. |
[16] | Y. Katsuka, S. Tanifuji and K. Yahagi, Two kinds of switching phenomena in TiO2 thin films, Japan. J. Appl. Phys. 11 (1972) 771-772. |
[17] | Y.-T. Li, S.-B. Long, H.-B. Lv, Q. Liu, Q. Wang, Y. Wang, S. Zhang, W.-T. Lian, S. Liu, and M. Liu, "A low-cost memristor based on titanium oxide," 10th IEEE Int. Conf. on Solid State and Integr. Circuit Technol 2010, Nov. 2010, pp. 1148-1150. |
[18] | L. Ortega-Reyes, A. Ávila-García, “Thermally grown vanadium oxide films and their electrical properties”, Materials Science in Semiconductor Processing 37 (2015) 123-128. |
[19] | A. Avila-Garcia, L. Ortega-Reyes, Memristive properties of thermally grown titanium and vanadium oxides, Memories of 15° Congreso Internacional de Metalurgia y Materiales, CONAMET-SAM, Concepción Chile, November 2015. |
[20] | J. G. Simmons, Generalized Formula for the Electric Tunnel Effect between Similar Electrodes Separated by a Thin Insulating Film, J. Appl. Phys. 34, 1793 (1963); doi: 10.1063/1.1702682. |
[21] | S. Kvatinsky, E. G. Friedman, A. Kolodny, and U. C. Weiser, TEAM: ThrEshold Adaptive Memristor Model, IEEE TRANSACTIONS ON CIRCUITS AND SYSTEMS—I: REGULAR PAPERS, VOL. 60, NO. 1, JANUARY 2013, pp. 211-221. |
[22] | M. E. FOUDA, A. G. RADWAN, ON THE FRACTIONAL-ORDER MEMRISTOR MODEL, Journal of Fractional Calculus and Applications, Vol. 4 (1) Jan. 2013, pp. 1- 7. ISSN: 2090-5858. |
[23] | L. Chua, Resistance switching memories are memristors, Appl. Phys. A (2011) 102: 765-783. |
[24] | A. Arreola-Pina, Oxido de titanio térmico para memristores, M.Sc. Thesis, CINVESTAV del I.P.N., Cd. De México, México, 2014. |
[25] | U. Balachandran and N. G. Eror. “Raman spectra of titanium dioxide”, J. Sol. St. Chem. 1982: 42 276-282. |
[26] | M. S. Zhang, Z. Yin et al. “Raman scattering by nanophase titanium dioxide”, Ferroelectrics 1995: 168 (1) 131-137. |
[27] | G. A. Tompsett, G. A. Bowmaker et al. “The Raman spectrum of brookite, TiO2 (Pbca, Z=8)”, J. of Raman Spec. 1995: 26 (1) 57-62. |