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AASCIT Communications | Volume 2, Issue 1 | Jan. 27, 2015 online | Page:11-17
Influence of Fluoride Content on the Anodic Formation of TiO2 Nanopores/Nanotubes in Ti Films
The formation of nanostructured TiO2 oxides in the form of nanotubes or nanopores grown on Ti films was investigated. Ti thin films were deposited by radio-frequency (RF) magnetron sputtering on silicon substrates and then anodized. Anodization was performed in glycerol electrolytes containing 0.6 wt.% and 1.2 wt.% ammonium fluoride (NH4F) with an applied potential from 20 to 60 V. The morphology and structure were identified by means of scanning electron microscopy (SEM) and X-ray diffractometry (XRD). The effects of fluoride concentration on the formation of nanotubes or nanopores prepared on Ti thin layer have not been understood, besides most of the works are focused on Ti sheet. We show in the present work that a simple parameter as the NH4F content in the electrolyte can turn the morphology from porous to tubular. It can allow an understanding of the mechanism of formation of pores/tubes and its practical impact.
P. M. Perillo, National Atomic Energy Commission, Constituyentes Atomic Center, Buenos Aires, Argentina.
D. F. Rodríguez, National Atomic Energy Commission, Constituyentes Atomic Center, Buenos Aires, Argentina.
RF Magnetron Sputtering, TiO2, Anodic Oxidation, Thin Film
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Arcticle History
Submitted: Jan. 5, 2015
Accepted: Jan. 17, 2015
Published: Jan. 27, 2015
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